64th Gaseous Electronics Conference (Acct #2142)
Invited Speakers

The GEC Executive Committee has selected several topics for special emphasis. The invited speakers, their affiliations and tentative titles of their presentations for the 2011 GEC are:

Foundation Talk

  • R. Gottscho, Lam Research Corporation, Plasma Etching - The challenges ahead in enabling nanoelectronics.

Heavy-Particle Collisions

  • M. Schultz, Missouri University of Science & Technology (US), Manipulating atomic fragmentation processes by controlling the projectile coherence
  • R. Barrachina, Centro Atómico Bariloche (Argentina), Multiple scattering effects in ionization processes

Electron-Molecule Collisions

  • T. Field, Queen's University Belfast (UK), Electron attachment to radicals and reactive molecules
  • A. Dorn, Max-Planck-Institut für Kernphysik (Germany), (e, 2e) experiments on small noble gas clusters: search for multicenter and interference effects
  • C. Malone, Jet Propulsion Laboratory (US), Low energy electron collision parameters for modeling auroral/day glow phenomena
  • D. Madison, Missouri University of Science & Technology (US), Accuracy of theoretical calculations for electron-impact ionization of large molecules
  • M. Khakoo, California State University (US), Low energy near-threshold electron impact electronic excitation of water and furan

Electron and Positron Scattering

  • G. García, Consejo Superior de Investigaciones Cientificas (Spain), Nanoscale models for energy deposition of photon, electrons and positrons in gases
  • J. Sullivan, Australian National University (Australia), Absolute measurements of differential cross sections in low energy positron scattering

High Pressure Plasmas

  • J-P. Boeuf, Université Paul Sabatier (France), Dynamics and pattern formation during microwave breakdown at atmospheric pressure

Plasma Diagnostics

  • J. Benedikt, Ruhr University (Germany), Diagnostics of atmospheric pressure microplasma jets by means of molecular beam mass spectrometry.
  • K. Tachibana, Ehime University (Japan), Spectroscopic diagnostics of high density plasmas
  • J. Hopwood, Tufts University (US), Spatially-resolved diagnostics of 1-GHz microdischarges

Plasma Etching

  • M. Izawa, Hitachi High-Technologies Corp (Japan), Mechanism of Si and metal etching based on sticking reaction model
  • S. Samukawa, Tohoku University (Japan), Damage-free neutral beam etching, deposition and surface modification processes for novel nano-scale devices

Electric Propulsion and Combustion

  • K. Sasaki, Hokkaido University (Japan), Effect of energetic electrons on combustion of premixed burner flame
  • J. Foster, University of Michigan (US), Mission Enabling: The plasma sources of electric propulsion-challenges and prospects for the future
  • A. Aanesland, Laboratoire de Physique des Plasmas (LPP) Ecole Polytechnique (France), Alternate acceleration of positive and negative ions for space propulsion applications

RF Plasmas

  • J. Schulze, Ruhr-University Bochum (Germany), Electron heating and the electrical asymmetry effect in capacitive rf discharges

Plasma Modeling

  • G. Cunge,Laboratoire des Technologies de la Microélectronique, CNRS (France), Analysis of pulsed etching plasmas by new optical and mass spectrometry based diagnostics
  • I. Kaganovich, Princeton Plasma Physics Laboratory (US), Nonlocal electron kinetics for plasma technologies
  • D. Economou, University of Houston (US), Control of ion energy distributions on plasma electrodes

Novel Plasma Applications

  • K. Terashima, University of Tokyo (Japan), Plasmas in High-Density Medium - Cryogenic plasma and supercritical fluid plasma
  • M. Bowden, The Open University (UK), Microdisharges: novel designs and novel materials
  • U. Kortshagen, University of Minnesota (US), The physics and applications of nanomaterials produced with nonthermal plasmas

Pulsed Discharges

  • G. Pemen, Eindhoven University of Technology (Holland), Streamers and their applications
  • I. Adamovich, Ohio State University (US), Nanosecond pulse discharges and fast ionization wave discharges: fundamental kinetic processes and applications